期刊
MEASUREMENT
卷 196, 期 -, 页码 -出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.measurement.2022.111264
关键词
Thin-film encapsulation; Barrier permeability; Spotless water vapor transmission rate
资金
- National Natural Science Foundation of China [61974054, 61675088]
- International Sci-ence and Technology Cooperation Program of Jilin [20190701023GH]
- Scientific and Technological Developing Scheme of Jilin Province [20200401045GX]
- Project of Sci-ence and Technology Development Plan of Jilin Province [20190302011G]
This paper presents a combined optical and electrical testing method that eliminates the influence of defects in the thin film encapsulation process and accurately measures the WVTR.
Optoelectronic devices' organic materials and metal electrodes are highly susceptible to water vapor. The use of a thin-film encapsulation technique is an effective solution. The accurate water vapor transmission rate (WVTR) of thin films, however, is challenging to acquire because of the influence of dust particles in industrial production laboratories. We have developed a low-cost, high accurate optical and electrical combined Ca corrosion test to analyze the permeation at the defects by optical camera and Matlab software, and established a model to eliminate the influence caused by defective spots in the WVTR method for the encapsulated film. We tested the WVTR of aluminum oxide (Al2O3) with different defect spot densities to ensure the accuracy and reliability of this process. The results illustrated that regardless of the sample defect spot density, the WVTR acquired by the test method reported in this paper generally agreed with the spotless WVTR.
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