Improved performance of transparent p-type conductors CuCrO2:Mg delafossite thin films through easy and low cost laser annealing

Films deposited on glass substrate by RF sputtering, were heat treated in air by a low power laser spot thanks to conventional photolithography machine, to obtain pure CuCr0.97Mg0.03O2 delafossite with an optical transmittance of 0.58 and a conductivity of 5.8S.cm(-1). The Haacke's figure of merit is improved to reach 2.07 x 10(7)Omega(-1). Laser annealing by a photolithography machine is thus very interesting for enhancing the p-type transparent conductor properties of such delafossite phases. A local annealing according to selected patterns could also be envisaged, opening up exciting prospects for fast and low cost making the most of these transparent ptype semiconductors.

Automated summary

Laser annealing by a photolithography machine is interesting for enhancing the p-type transparent conductor properties of delafossite phases, and the prospect of local annealing according to selected patterns opens up exciting possibilities for fast and low-cost manufacturing of these transparent p-type semiconductors.