期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
卷 40, 期 3, 页码 -出版社
A V S AMER INST PHYSICS
DOI: 10.1116/6.0001700
关键词
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资金
- Swedish Research Council [VR-2015-04630, VR-2021-04113]
- Aforsk Foundation [AF 19-137]
- Olle Engkvist Foundation [SOEB 190-31]
- Wenner-Gren Foundations [UPD2018-0071, UPD2019-0007]
- French Government program Investissements d'Avenir (LABEX INTERACTIFS) [ANR-11-LABX-0017-01]
- Swedish Research Council [2021-04113] Funding Source: Swedish Research Council
We demonstrate the ability to manipulate the morphology of thin noble-metal films using alloying species. The addition of these species promotes two-dimensional growth morphology but increases electrical resistivity. By deploying these alloying agents at different stages, we can selectively control the film morphology.
We demonstrate a versatile concept for manipulating morphology of thin (& LE;25 nm) noble-metal films on weakly interacting substrates using growth of Ag on SiO2 as a model system. The concept entails deployment of minority metallic (Cu, Au, Al, Ti, Cr, and Mo) alloying species at the Ag-layer growth front. Data from in situ and real-time monitoring of the deposition process show that all alloying agents-when deployed together with Ag vapor throughout the entire film deposition-favor two-dimensional (2D) growth morphology as compared to pure Ag film growth. This is manifested by an increase in the substrate area coverage for a given amount of deposited material in discontinuous layers and a decrease of the thickness at which a continuous layer is formed, though at the expense of a larger electrical resistivity. Based on ex situ microstructural analyses, we conclude that 2D morphological evolution under the presence of alloying species is predominantly caused by a decrease of the rate of island coalescence completion during the initial film-formation stages. Guided by this realization, alloying species are released with high temporal precision to selectively target growth stages before and after coalescence completion. Pre-coalescence deployment of all alloying agents yields a more pronounced 2D growth morphology, which for the case of Cu, Al, and Au is achieved without compromising the Ag-layer electrical conductivity. A more complex behavior is observed when alloying atoms are deposited during the post-coalescence growth stages: Cu, Au, Al, and Cr favor 2D morphology, while Ti and Mo yield a more pronounced three-dimensional morphological evolution. The overall results presented herein show that targeted deployment of alloying agents constitutes a generic platform for designing bespoken heterostructures between metal layers and technologically relevant weakly interacting substrates.& nbsp;Published under an exclusive license by the AVS.
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