期刊
JOURNAL OF THE TAIWAN INSTITUTE OF CHEMICAL ENGINEERS
卷 134, 期 -, 页码 -出版社
ELSEVIER
DOI: 10.1016/j.jtice.2022.104357
关键词
Template method; Solar-light-response; Photocatalyst; Charge separation; S-scheme heterojunction; Dye decolorization
资金
- Ministry of Science and Tech-nology (MOST) , Taiwan, R.O.C. [109-2221-E-005-020-MY3]
- MOST
This study successfully addressed the limitations of g-C3N4, including its low specific surface area and high charge recombination rate, by developing a g-C3N4/ZnO S-scheme heterojunction photocatalyst. The optimized catalyst exhibited excellent decolorization performance for dye degradation.
Background: The low specific surface area (SSA) and high charge recombination rate of g-C3N4 (hereafter referred to as CN) limit its applications for dye photodegradation. A photocatalyst that enhanced the SSA and retarded the charge recombination rate of g-C3N4 was developed in this study. Methods: In this study, a g-C3N4/ZnO S-scheme heterojunction photocatalyst was prepared via template method. Zeolitic-imidazolate-framework-8 (ZIF8) was used as a template of g-C3N4 and as a precursor of ZnO. This method addressed the two above-mentioned limitations of CN simultaneously. Significant findings: It was confirmed that when calcination temperature was controlled at 450 degrees C, g-C3N4/ ZnO S-scheme heterojunction was successfully fabricated to enhance the specific surface area and charge separation rate of g-C3N4. CN/ZIF8-450 displayed optimal AR1 decolorization performance (95%), which was 1.6 times higher than that of CN (43%), when the reaction time was 1 h. The excellent performance of CN/ ZIF8-450 was attributed to its high specific surface area (182.8 m2/g), 3.4 times higher than that of CN (53.6 m2/g), and low charge recombination rate due to the S-scheme heterojunction. The main reaction species in this system were center dot O2- and h+. This study provided a simple approach to overcoming the limitations of CN in dye wastewater treatment. (c) 2022 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
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