4.5 Review

Surface nanopatterning by ion beam irradiation: compositional effects

期刊

JOURNAL OF PHYSICS-CONDENSED MATTER
卷 34, 期 33, 页码 -

出版社

IOP Publishing Ltd
DOI: 10.1088/1361-648X/ac75a1

关键词

surface nanopatterning; ion beam sputtering; chemical effects; co-deposition; ripple; dot; silicides

资金

  1. Ministerio de Economia, Industria y Competitividad (MINECO, Spain)
  2. Agencia Estatal de Investigacion (AEI, Spain)
  3. Fondo Europeo de Desarrollo Regional (FEDER, EU) [PGC2018-094763-B-I00]
  4. Comunidad de Madrid (Spain)
  5. TRANSNANOAVANSENS program [S2018-NMT-4349]
  6. UC3M [EPUC3M23]

向作者/读者索取更多资源

Surface nanopatterning induced by ion beam irradiation (IBI) is an effective nanostructuring technique that can induce patterns on large areas of various materials, with short processing time and low cost. This review focuses on the progress in IBI nanopatterning when the surface composition plays a relevant role, specifically with simultaneous co-deposition of foreign atoms. It also discusses advances in IBI of compound surfaces and IBI systems using non-noble gas ions.
Surface nanopatterning induced by ion beam irradiation (IBI) has emerged as an effective nanostructuring technique since it induces patterns on large areas of a wide variety of materials, in short time, and at low cost. Nowadays, two main subfields can be distinguished within IBI nanopatterning depending on the irrelevant or relevant role played by the surface composition. In this review, we give an up-dated account of the progress reached when surface composition plays a relevant role, with a main focus on IBI surface patterning with simultaneous co-deposition of foreign atoms. In addition, we also review the advances in IBI of compound surfaces as well as IBI systems where the ion employed is not a noble gas species. In particular, for the IBI with concurrent metal co-deposition, we detail the chronological evolution of these studies because it helps us to clarify some contradictory early reports. We describe the main patterns obtained with this technique as a function of the foreign atom deposition pathway, also focusing in those systematic studies that have contributed to identify the main mechanisms leading to the surface pattern formation and development. Likewise, we explain the main theoretical models aimed at describing these nanopattern formation processes. Finally, we address two main special features of the patterns induced by this technique, namely, the enhanced pattern ordering and the possibility to produce both morphological and chemical patterns.

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