4.6 Article

Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide

期刊

JOURNAL OF APPLIED PHYSICS
卷 131, 期 12, 页码 -

出版社

AIP Publishing
DOI: 10.1063/5.0083858

关键词

-

资金

  1. Norwegian Micro- and Nano-Fabrication Facility, NorFab [295864]
  2. Norwegian Center for Transmission Electron Microscopy, NORTEM [197405]
  3. Functionalization of Conducting Oxides by Ion beam and defect engineering [287729]
  4. INTPART Program at the Research Council of Norway [261574, 322382]
  5. CANAM (Centre of Accelerators and Nuclear Analytical Methods) infrastructure [LM 2015056]
  6. MEYS of the Czech Republic [CZ.02.1.01/0.0/0.0/16_013/0001812]

向作者/读者索取更多资源

Defect accumulation and annealing phenomena in Si-implanted monoclinic gallium oxide wafers were studied using RBS/c, XRD, and (S)TEM. The accumulation of radiation disorder was found to be accompanied by strain accumulation, resulting in crystalline-to-crystalline phase transitions. Annealing of selected samples showed complex structural transformations, which were influenced by the fluence and temperature.
Defect accumulation and annealing phenomena in Si-implanted monoclinic gallium oxide (beta-Ga2O3) wafers, having ((2) over bar 01), (010), and (001) orientations, were studied by Rutherford backscattering spectrometry in channeling mode (RBS/c), x-ray diffraction (XRD), and (scanning) transmission electron microscopy [(S)TEM]. Initially, the samples with different surface orientations were implanted with 300 keV Si-28(+)-ions, applying fluences in the range of 1 x 10(14)-2 x 10(16) Si/cm(2), unveiling interesting disorder accumulation kinetics. In particular, the RBS/c, XRD, and (S)TEM combined data suggested that the radiation disorder buildup in Si-implanted beta-Ga2O3 is accompanied by significant strain accumulation, assisting crystalline-to-crystalline phase transitions instead of amorphization. Selected samples having ((2) over bar 01 ) orientation were subjected to isochronal (30 min) anneals in the range of 300-1300 degrees C in air. Systematic RBS/c and XRD characterization of these samples suggested complex structural transformations, which occurred as a function of the fluence and the temperature. Moreover, a detailed (S)TEM analysis of the sample implanted with 2 x 10(16) Si/cm(2) and annealed at 1100 degrees C was enhanced by applying dispersive x-ray and electron energy-loss spectroscopies. The analysis revealed silicon agglomerations in the form of silicon dioxide particles. Signal from silicon was also detected outside of the agglomerates, likely occurring as substitutional Si on Ga sites. Published under an exclusive license by AIP Publishing.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据