4.5 Article Proceedings Paper

Analysis of Heavy-Ion-Induced Leakage Current in SiC Power Devices

期刊

IEEE TRANSACTIONS ON NUCLEAR SCIENCE
卷 69, 期 3, 页码 248-253

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TNS.2021.3136806

关键词

Ions; Silicon carbide; Leakage currents; Degradation; MOSFET; Schottky diodes; Current measurement; Schottky diodes; silicon carbide; single-event effects; vertical metal-oxide-semiconductor field-effect transistor (MOSFET)

资金

  1. NASA's Space Technology Research Grants Program [NNX17AD09G, 80NSSC20K1333]
  2. NASA [NNX17AD09G, 1003281] Funding Source: Federal RePORTER

向作者/读者索取更多资源

This study presents a method for analyzing ion-induced reverse leakage current in SiC power devices, allowing for the estimation of the impact of different ion strikes on leakage current.
A method of analyzing ion-induced reverse leakage current in SiC power devices is described. The resulting methodology enables the estimation of the proportion of ion strikes that produce step increases in leakage current as well as distributions of sensitive die areas relative to leakage step magnitude. These results are compared across various bias and ion linear energy transfer combinations to isolate the influence of each variable.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据