期刊
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
卷 69, 期 3, 页码 248-253出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TNS.2021.3136806
关键词
Ions; Silicon carbide; Leakage currents; Degradation; MOSFET; Schottky diodes; Current measurement; Schottky diodes; silicon carbide; single-event effects; vertical metal-oxide-semiconductor field-effect transistor (MOSFET)
资金
- NASA's Space Technology Research Grants Program [NNX17AD09G, 80NSSC20K1333]
- NASA [NNX17AD09G, 1003281] Funding Source: Federal RePORTER
This study presents a method for analyzing ion-induced reverse leakage current in SiC power devices, allowing for the estimation of the impact of different ion strikes on leakage current.
A method of analyzing ion-induced reverse leakage current in SiC power devices is described. The resulting methodology enables the estimation of the proportion of ion strikes that produce step increases in leakage current as well as distributions of sensitive die areas relative to leakage step magnitude. These results are compared across various bias and ion linear energy transfer combinations to isolate the influence of each variable.
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