期刊
ACS NANO
卷 16, 期 4, 页码 5418-5426出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsnano.1c09136
关键词
two-dimensional material; ferroelectric memory; ferroelectric transistor; van der Waal heterostructures; nonvolatile memory
类别
资金
- Basic Science Research Program through the National Research Foundation of Korea - Korean government [2022R1A2C3003068, 2020R1A4A2002806, 2020M3F3A2A03082047, 2013M3A6B1078873]
- Samsung Electronics Co., Ltd. [IO201215-08197-01]
- National Research Foundation of Korea [2020M3F3A2A03082047, 2020R1A4A2002806, 2022R1A2C3003068] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
2D van der Waal heterostructures (vdWHs) show potential in developing FeFETs with long data retention and endurance characteristics.
Channel current conduction modulation with the spontaneous polarization of ferroelectric films in ferroelectric field-effect transistors (FeFETs) has been widely investigated. Low interface quality and thermodynamic instability owing to the presence of dangling bonds in the conventional ferroelectrics have limited the memory retention and endurance of FeFETs. This, in turn, prevents their commercialization. However, the atomically thin nature of 2D ferroelectric, semiconducting, and insulating films facilitate the achievement of trapfree interfaces as van der Waal heterostructures (vdWHs) to develop FeFETs with long data retention and endurance characteristics. Here, we demonstrate a 2D vdWH FeFET fabricated with ferroelectric CuInP2S6 (CIPS), hexagonal boron nitride (h-BN) as the dielectric, and InSe as the ferroelectric semiconductor channel. The device shows an excellent performance as nonvolatile memory (NVM) with its large memory window (4.6 V at a voltage sweep of 5 V), high drain current on/off ratio (>104), high endurance, and long data retention (>104 s). These results demonstrate the considerable potential of vdWHs for the development of FeFETs for logic and NVM applications.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据