期刊
MATERIALIA
卷 20, 期 -, 页码 -出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.mtla.2021.101246
关键词
Silicon carbide; In situ synchrotron X-ray topography; Dislocation dynamics; Climb; Stacking faults
资金
- Council for Science, Technology and Innovation (CSTI) ,Cross-ministerial Strategic Innovation Promotion Program (SIP) , Next-generation power electronics/Consistent RD of next-generation SiC power electronics (New Energy and Industrial Technology Devel
- [JP20J13314]
The expansion of double Shockley stacking faults (DSFs) in an n-type 4H-SiC substrate with a nitrogen concentration of 3.9 x 10(19) cm(-3) was found to be suppressed and immobilized above 1590 K, with the shape of partial dislocation (PD) changing from straight to zig-zag configuration. Possible mechanism of this immobilization was proposed to involve non-conservative motion induced by the interaction between PDs and point defects.
The expansion of double Shockley stacking faults (DSFs) in an n-type 4H-SiC substrate with a nitrogen concentration of 3.9 x 10(19) cm(-3) was investigated using in situ synchrotron X-ray topography. DSF expansion was observed to be suppressed and immobilized above 1590 K, along with the partial dislocation (PD) shape being changed from a straight to zig-zag configuration. For a different heating process (higher heating rate), the PDs could continue to expand, even above 1590 K. Ex situ topography experiments revealed that the DSFs close to the specimen surface expanded widely, although those expanding toward the specimen interior became immobile. One possible mechanism for this immobilization was proposed, where the core structural changes from a Si-core to the C-core by non-conservative motion induced by the interaction between the PDs and point defects (C interstitials).
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