4.6 Article

Room-Temperature Formation of Hard BCx Films by Low Power Magnetron Sputtering

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Influence of Substrate Temperature on Electrical and Optical Properties of Hydrogenated Boron Carbide Thin Films Deposited by RF Sputtering

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Summary: Amorphous hydrogenated boron carbide films were deposited on silicon and glass substrates using radio frequency sputtering. The substrate temperature during deposition was found to have significant effects on the electrical and optical properties of the deposited films. With higher substrate deposition temperature, a decreasing trend in dielectric value and resistivity of the films was observed, with dielectric values ranging from 6.5-3.5 for different substrate temperatures.

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