Ultra-Steep-Slope High-Gain MoS2 Transistors with Atomic Threshold-Switching Gate

The fundamental Boltzmann limitation dictates the ultimate limit of subthreshold swing (SS) to be 60 mV dec(-1), which prevents the continued scaling of supply voltage. With atomically thin body, 2D semiconductors provide new possibilities for advanced low-power electronics. Herein, ultra-steep-slope MoS2 resistive-gate field-effect transistors (RG-FETs) by integrating atomic-scale-resistive filamentary with conventional MoS2 transistors, demonstrating an ultra-low SS below 1 mV dec(-1) at room temperature are reported. The abrupt resistance transition of the nanoscale-resistive filamentary ensures dramatic change in gate potential, and switches the device on and off, leading to ultra-steep SS. Simultaneously, RG-FETs demonstrate a high on/off ratio of 2.76 x 10(7) with superior reproducibility and reliability. With the ultra-steep SS, the RG-FETs can be readily employed to construct logic inverter with an ultra-high gain approximate to 2000, indicating exciting potential for future low-power electronics and monolithic integration.

Automated summary

This study demonstrates ultra-low subthreshold swing (SS) and ultra-steep slope by integrating atomic-scale resistive filament with conventional MoS2 transistors. The nanoscale resistive filament ensures rapid device switching, leading to ultra-steep SS. The study also shows high on/off ratio and superior reproducibility and reliability. These findings provide exciting potential for future low-power electronics and monolithic integration.