4.7 Review

Review of Si-Based GeSn CVD Growth and Optoelectronic Applications

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Summary: The study presents a high-performance back-illuminated GeSn/Ge multiple-quantum-well photodiode fabricated on a 300-mm silicon substrate using CMOS compatible processes. The device shows broadband photo-response between 1,000-2,100 nm with high responsivity and specific detectivity, suitable for image sensing systems in the short-wave infrared range.

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Summary: The demonstration of 2D hole gases in GeSn/Ge heterostructures shows a high mobility of up to 20,000 cm(2) V-1 s(-1). The study observed Shubnikov-de Haas oscillations and integer quantum Hall effect, and investigated the Rashba spin-orbit coupling through magneto-transport. Additionally, a transition from weak localization to weak anti-localization was observed, demonstrating the tunability of SOC strength by gating.

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Summary: GeSn alloy shows potential for the integration of spintronics, photonics, and electronics. Research investigates the photoinduced inverse spin-Hall effect at different energy ranges, extracting a significantly larger spin-Hall angle in GeSn compared to pure Ge. The spin-charge interconversion in GeSn is found to be approximately 4.3 times larger for electrons in the Delta valleys than in the L valleys.

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Extended Compositional Range for the Synthesis of SWIR and LWIR Ge1-ySny Alloys and Device Structures via CVD of SnH4 and Ge3H8

Matthew A. Mircovich et al.

Summary: A chemical vapor deposition (CVD) strategy was presented for the synthesis of Ge1-ySny alloys with band gaps in SWIR and LWIR ranges, achieved through CVD reactions of Ge3H8 and SnH4. The use of SnH4 as a precursor allows for alloys with Sn contents between 30-36% at low temperatures, with reduced cost and potential for commercial applications. Optical experiments showed that Ge1-ySny alloys synthesized with SnH4 could cover much of the LWIR range.

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Schottky Barrier Height Modulation of Metal/n-GeSn Contacts Featuring Low Contact Resistivity by in Situ Chemical Vapor Deposition Doping and NiGeSn Alloy Formation

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Summary: This study investigates the Schottky characteristics and contact resistivity in metal/n-GeSn contacts, focusing on the impact of Sn fraction and metal work functions. By using in situ doping and a post-metal annealing step to form NiGeSn alloys, the contact resistivity is effectively reduced to a record low level of about 1.5 x 10(-7) Omega.cm(2) without any surface treatment. This reduction is attributed to the decreased Schottky barrier height achieved by increasing the Sn fraction in the n-GeSn film and the high carrier density achieved by in situ doping.

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Electron Mobility Enhancement in GeSn n-Channel MOSFETs by Tensile Strain

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Thermal Stability and Sn Segregation of Low-Resistance Ti/p+-Ge0.95Sn0.05 Contact

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Multilayer Graphene-GeSn Quantum Well Heterostructure SWIR Light Source

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Boron-doping induced Sn loss in GeSn alloys grown by chemical vapor deposition

Chung-En Tsai et al.

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2D hexagonal photonic crystal GeSn laser with 16% Sn content

Q. M. Thai et al.

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Dian Lei et al.

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Wei Dou et al.

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All group-IV SiGeSn/GeSn/SiGeSn QW laser on Si operating up to 90K

Joe Margetis et al.

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GeSn heterostructure micro-disk laser operating at 230 K

Quang Minh Thai et al.

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GeSn/SiGeSn Heterostructure and Multi Quantum Well Lasers

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Jiuren Zhou et al.

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Fabrication, Characterization, and Analysis of Ge/GeSn Heterojunction p-Type Tunnel Transistors

Christian Schulte-Braucks et al.

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Schottky barrier tuning via dopant segregation in NiGeSn-GeSn contacts

Christian Schulte-Braucks et al.

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Investigation of optical transitions in a SiGeSn/GeSn/SiGeSn single quantum well structure

Wei Du et al.

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Growth and structural properties of step-graded, high Sn content GeSn layers on Ge

J. Aubin et al.

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Optically pumped GeSn micro-disks with 16% Sn lasing at 3.1 μm up to 180K

V. Reboud et al.

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Optical Characterization of Si-Based Ge1-x Sn x Alloys with Sn Compositions up to 12%

Sattar Al-Kabi et al.

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Jianxiong Li et al.

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An optically pumped 2.5 μm GeSn laser on Si operating at 110 K

Sattar Al-Kabi et al.

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Interplay between relaxation and Sn segregation during thermal annealing of GeSn strained layers

C. M. Comrie et al.

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Structural and Optical Characteristics of GeSn Quantum Wells for Silicon-Based Mid-Infrared Optoelectronic Applications

Wei Dou et al.

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Aboozar Mosleh et al.

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Lasing in direct-bandgap GeSn alloy grown on Si

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SnGe superstructure materials for Si-based infrared optoelectronics

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