Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition

A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to alpha-U3O8 or alpha-UO3. X-ray diffraction revealed preferential orientation along (100) in case of alpha-U3O8 or (001) for alpha-UO3 for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be alpha-U3O8. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.

Automated summary

A thin film of uranium oxide was successfully deposited on a single crystal substrate with a specific orientation using polymer assisted deposition. The sample was confirmed to be alpha-U3O8 through a combination of X-ray and neutron reflectometry techniques. The film had a thickness of 17 nm and was covered by a less dense capping layer, possibly due to surface water adsorption.