4.7 Article

Revised parametrization of the recombination velocity at SiO2/SiNx-passivated phosphorus-diffused surfaces

相关参考文献

注意:仅列出部分参考文献,下载原文获取全部文献信息。
Review Physics, Applied

Passivated emitter and rear cell-Devices, technology, and modeling

Ralf Preu et al.

APPLIED PHYSICS REVIEWS (2020)

Article Physics, Applied

Precise parameterization of the recombination velocity at passivated phosphorus doped surfaces

Achim Kimmerle et al.

JOURNAL OF APPLIED PHYSICS (2016)

Article Energy & Fuels

Carrier-diffusion corrected J0-analysis of charge carrier lifetime measurements for increased consistency

Achim Kimmerle et al.

SOLAR ENERGY MATERIALS AND SOLAR CELLS (2015)

Article Materials Science, Multidisciplinary

Improved quantitative description of Auger recombination in crystalline silicon

Armin Richter et al.

PHYSICAL REVIEW B (2012)

Article Energy & Fuels

Silicon Surface Passivation by Thin Thermal Oxide/PECVD Layer Stack Systems

Sebastian Mack et al.

IEEE JOURNAL OF PHOTOVOLTAICS (2011)