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Promotive effects of vacuum-UV/UV (185/254 nm) light on elimination of recalcitrant trace organic contaminants by UV-AOPs during wastewater treatment and reclamation: A review

期刊

SCIENCE OF THE TOTAL ENVIRONMENT
卷 818, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.scitotenv.2021.151776

关键词

Vacuum UV; Trace organic contaminant; Advanced oxidation process; Water treatment; Radical oxidation

资金

  1. National Natural Science Foundation of China [52000115, 52070110]
  2. Shenzhen Science, Technology and Innovation Commission [JCYJ20170818091859147]

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The use of VUV/UV-AOPs for eliminating trace organic contaminants in wastewater has gained attention, but the mechanisms and influencing factors are not well understood. Further research and optimization are needed for this promising method.
The use of vacuum-UV/UV (185/254 nm) for trace organic contaminants (TOrCs) elimination during wastewater treatments has attracted much attention. Advanced oxidation processes which combine VUV/UV and additional oxidants (vacuum-UV/UV-based advanced oxidation processes, VUV/UV-AOPs) provide a promising method for eliminating recalcitrant and toxic TOrCs for wastewater reclamation. Researches in this area are increasing but the promoting effects, mechanisms, and influencing factors have not been well summarized. A comprehensive discussion of the limitations of this technique and future research directions is needed. VUV/UV-AOPs have considerable synergistic effects by increasing usage of VUV/UV photons and the oxidant, which increases radical generation. In terms of elimination kinetics, VUV/UV-AOPs outperform conventional UV-AOPs and VUV/UV processes in most cases; a 1.2-87.7-fold increase of the fluence-based kinetic constant is achieved. In terms of energy efficiency per order (EE/ O) of TOrCs elimination, the EE/O of VUV/UV-AOPs only accounts for4% of UV-AOPs and 63% ofVUV/UV. However, VUV/UV-AOPs still need to be further investigated. Firstly, although VUV and UV processes have similar radical formation pathways, limited information is available on the quantum yields of photolysis and radical formation of oxidants under VUV irradiation. Secondly, optimization of VUV/UV-AOPs operating conditions, especially oxidant dosage and water-flowpatterns, is needed. Thirdly, VUV/UV-AOPs are significantly inhibited by organic and inorganic matters, but the mechanisms of inhibition on VUV/UV scattering, radical quenching, and radical conversion are not well understood. Such inhibition suggests that the use of VUV/UV-AOPs would be limited to relatively clear water treatment, e.g., reverse osmosis effluent for potable water reuse and ultrapure water production. Related research is needed to establish a clearer scheme for VUV/UV-AOPs in terms of the spatial distribution of radical species in the VUV/UV irradiation system and the relevant optimization method for promoting oxidation performance.

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