期刊
POWDER TECHNOLOGY
卷 396, 期 -, 页码 395-405出版社
ELSEVIER
DOI: 10.1016/j.powtec.2021.10.045
关键词
Chemical-mechanical polishing slurry; Differential mobility analysis; Size distribution measurement; Dynamic light scattering
资金
- Kanomax FMT Inc..
- NSF [DMR-2011401, ECCS-2025124]
The aerosol technique, differential mobility analysis (LNS), is found to be more repeatable and accurate in characterizing CMP slurries compared to dynamic light scattering (DLS). LNS not only captures multimodal size distributions but also provides more precise information on the size distribution of slurry particles.
In chemical mechanical planarization (CMP), a particle slurry is used in polishing semiconductor wafers. Key to CMP performance is the size distribution of the particles. We evaluate the potential of an aerosol technique, namely differential mobility analysis (in a liquid nanoparticle sizer, LNS, system) to characterize size distributions of CMP slurries. LNS measurements are compared to size distributions inferred from electron microscopy (SEM), and dynamic light scattering (DLS). LNS measurements are more repeatable than DLS measurements, and for 4 silica slurries, LNS distributions are in better agreement with SEM measurements than DLS. We find also that the LNS can quantify multimodal size distributions. For non-silica slurries, LNS, DLS, and SEM measurements have geometric mean diameters which can vary from another by 10 nm or more. However, because each measurement type is internally consistent, the combination of LNS and DLS, which are automated, yields augmented information on slurry properties. (c) 2021 Elsevier B.V. All rights reserved.
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