期刊
NANO LETTERS
卷 21, 期 19, 页码 8348-8354出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.1c02853
关键词
Time-resolved atomic force microscopy; defected metal-oxide semiconductors; titanium dioxide (TiO2); ultraviolet irradiation; surface defects
类别
资金
- Natural Sciences and Engineering Research Council of Canada
- Le Fonds de Recherche du Quebec -Nature et Technologies
- E'cole de technologie superieure, University of Quebec
- UK MOD [DSTLX-1000116630]
- Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) [EXC 2089/1-390776260]
- Bavarian program Solar Energies Go Hybrid (SolTech)
- Center for NanoScience (CeNS)
- European Commission through the ERC Starting Grant CATALIGHT [802989]
- EPSRC Centre of Doctoral Training in Molecular Modelling and Material Science [EP/L015862/1]
- EPSRC-UK [EP/M013812/1]
- EPSRC [EP/R034540/1]
- EPSRC [EP/R034540/1, EP/M013812/1] Funding Source: UKRI
The impact of photoinduced surface oxygen vacancies (PI-SOV) on the dynamics of hole migration in MOS films, such as titanium dioxide, was measured using time-resolved atomic force microscopy. The results show that the time constant associated with hole migration is strongly affected by PI-SOV in a reversible manner, providing insights into hole dynamics physics and enabling the development of emerging technologies.
Metal-oxide semiconductors (MOS) are widely utilized for catalytic and photocatalytic applications in which the dynamics of charged carriers (e.g., electrons, holes) play important roles. Under operation conditions, photoinduced surface oxygen vacancies (PI-SOV) can greatly impact the dynamics of charge carriers. However, current knowledge regarding the effect of PI-SOV on the dynamics of hole migration in MOS films, such as titanium dioxide, is solely based upon volume-averaged measurements and/or vacuum conditions. This limits the basic understanding of hole-vacancy interactions, as they are not capable of revealing time-resolved variations during operation. Here, we measured the effect of PI-SOV on the dynamics of hole migration using time-resolved atomic force microscopy. Our findings demonstrate that the time constant associated with hole migration is strongly affected by PI-SOV, in a reversible manner. These results will nucleate an insightful understanding of the physics of hole dynamics and thus enable emerging technologies, facilitated by engineering hole-vacancy interactions.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据