Single-step process for transparent conductive ZnO:Ga films with uniform ultrahigh haze by oblique angle deposition

Increasing the haze of front electrodes of solar cells while retaining high optical transmittance is beneficial for increasing the power conversion efficiency. However, conventional methods of fabricating hazy films require additional etching steps or materials. Moreover, depositing large-area transparent conductive oxides with uniform ultrahigh haze is challenging. Here, we combine the oblique angle deposition and the atmospheric pressure plasma jet to produce GZO with a uniform ultrahigh haze of > 80% (non-uniformity similar to 1.35%), high transmittance of 88% (referenced to the substrate), and resistivity of 1.96 x 10(-3) Omega cm in a single step. We show that the high haze is caused by the pre-deposition of adsorbed particles on the bare substrate downstream and that the upstream dummy area should be avoided for high uniformity. Unlike existing methods, our method produces uniform films with ultrahigh haze and good transmittance in a single step without additional etching/materials or changing parameters during operation.

Automated summary

By combining oblique angle deposition and atmospheric pressure plasma jet, we have successfully produced GZO films with uniform ultrahigh haze, high transmittance, and low resistivity. Unlike conventional methods, our single-step approach does not require additional steps/materials or parameter changes during operation.