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DIAMOND AND RELATED MATERIALS (2005)
The affinity of Si-N and Si-C bonding in amorphous silicon carbon nitride (a-SiCN) thin film
CW Chen et al.
DIAMOND AND RELATED MATERIALS (2005)
Silicon carbonitride films produced by remote hydrogen microwave plasma CVD using a (dimethylamino)dimethylsilane precursor
I Blaszczyk-Lezak et al.
CHEMICAL VAPOR DEPOSITION (2005)
IR-study of a-SiCx:H and a-SiCxNx:H films for c-Si surface passivation
M Vetter et al.
THIN SOLID FILMS (2004)
Investigations on hardness of rf sputter deposited SiCN thin films
KB Sundaram et al.
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING (2004)
Effect of silicon doping on the mechanical and optical properties of carbon nitride thin films
D Sarangi et al.
THIN SOLID FILMS (2004)
Mechanical and optical properties of hard SiCN coatings prepared by PECVD
P Jedrzejowski et al.
THIN SOLID FILMS (2004)
Hard Si-N-C coatings produced by pulsed glow discharge deposition
I Afanasyev-Charkin et al.
SURFACE & COATINGS TECHNOLOGY (2004)
Silicon carbonitride films by remote hydrogen-nitrogen plasma CVD from a tetramethyldisilazane source
AM Wrobel et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2004)
Effect of nitrogen gas flow on amorphous Si-C-N films produced by PVD techniques
C Moura et al.
SURFACE & COATINGS TECHNOLOGY (2003)
Band gap engineering of SiCN film grown by pulsed laser deposition
NM Park et al.
JOURNAL OF APPLIED PHYSICS (2003)
Use of plasma polymerized highly hydrophobic hexamethyldissilazane (HMDS) films for sensor development
MLP da Silva et al.
SENSORS AND ACTUATORS B-CHEMICAL (2003)
SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors
TP Smirnova et al.
THIN SOLID FILMS (2003)
Plasmapolymerized silicon organic thin films from HMDSN for capacitive humidity sensors
F Kraus et al.
SENSORS AND ACTUATORS B-CHEMICAL (2003)
Composition and structure of films deposited from silyl derivatives of asymmetrical dimethylhydrazine
TP Smirnova et al.
INORGANIC MATERIALS (2003)
Mechanical properties of silicon carbonitride thin films
XF Peng et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS (2003)
Hardness and Young's modulus of high-quality cubic boron nitride films grown by chemical vapor deposition
X Jiang et al.
JOURNAL OF APPLIED PHYSICS (2003)
Synthesis of nanocrystalline silicon carbonitride films by remote plasma enhanced chemical vapor deposition using the mixture of hexamethyldisilazane with helium and ammonia
NI Fainer et al.
JOURNAL OF CRYSTAL GROWTH (2003)
Microstructure and chemical bonding in silicon carbonitride films synthesized by plasma enhanced chemical vapor deposition
TP Smirnova et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2003)
Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition
SF Ting et al.
JOURNAL OF ELECTRONIC MATERIALS (2002)
Influence of nitrogen-argon gas mixtures on reactive magnetron sputtering of hard Si-C-N films
J Vlcek et al.
SURFACE & COATINGS TECHNOLOGY (2002)
Bonding configurations and optical band gap for nitrogenated amorphous silicon carbide films prepared by pulsed laser ablation
S Trusso et al.
JOURNAL OF APPLIED PHYSICS (2002)
Mechanical and tribological properties of thin remote microwave plasma CVD a-Si:N:C films from a single-source precursor
D Bielinski et al.
TRIBOLOGY LETTERS (2002)
Synthesis of amorphous silicon carbonitride films by pulsed laser deposition
S Boughaba et al.
THIN SOLID FILMS (2002)
Correlations between properties and applications of the CVD amorphous silicon carbide films
I Kleps et al.
APPLIED SURFACE SCIENCE (2001)
Hard amorphous silicon carbonitride coatings produced by plasma enhanced chemical vapour deposition
G Marx et al.
STEEL RESEARCH (2001)
Microstructure, mechanical properties, and wetting behavior of Si-C-N thin films grown by reactive magnetron sputtering
T Berlind et al.
SURFACE & COATINGS TECHNOLOGY (2001)
Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
DH Zhang et al.
THIN SOLID FILMS (2000)
Effects of nitrogen fraction on the structure of amorphous silicon-carbon-nitrogen alloys
Y Gao et al.
THIN SOLID FILMS (2000)
Plasma-enhanced chemical vapor deposition of silicon carbonitride using hexamethyldisilazane and nitrogen
DH Kuo et al.
THIN SOLID FILMS (2000)
Effect of H-2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
JJ Wu et al.
JOURNAL OF MATERIALS CHEMISTRY (2000)
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