4.6 Article

Oblique angle deposition of boron carbide films by magnetron sputtering

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Summary: The study investigated the effects of substrate tilt on properties of gold-tantalum alloy films deposited by magnetron sputtering. It was found that the deposition rate and film density decrease with increasing substrate tilt angle, leading to changes in film properties such as porosity and electrical resistivity. The critical tilt angle for increased resistivity was determined to be between 40 and 60 degrees.

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