4.7 Article

Atomic-layer-deposited ZnSnO buffer layers for kesterite solar cells: Impact of Zn/(Zn plus Sn) ratio on device performance

期刊

JOURNAL OF ALLOYS AND COMPOUNDS
卷 895, 期 -, 页码 -

出版社

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2021.162651

关键词

CZTSSe; ALD; Buffer layers; Efficiency

资金

  1. Human Resources Development of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) from the Ministry of Trade, Industry & Energy, Republic of Korea [20164030201310]
  2. National Research Foundation of Korea [NRF-2019M1A2A2072421]

向作者/读者索取更多资源

Atomic layer deposition (ALD) has been used to synthesize ZnSnO thin films with different Zn/(Zn+Sn) ratios, and their application as buffer layers in CZTSSe solar cells has been investigated. The solar cells with ZnSnO buffer layers show a significant improvement in short-circuit current density (J(sc)) compared to the CdS-buffered devices, primarily due to the wide band gap and high transparency of ZnSnO films. The results also demonstrate that the Zn/(Zn+Sn) ratio has a significant impact on the device parameters, particularly the open-circuit voltage (V-oc) and fill factor (FF).
Atomic layer deposition (ALD) has been used to synthesize earth-abundant and non-toxic ZnSnO thin films as potential replacements for CdS buffer layers in thin-film solar cells. In this study, ALD ZnSnO films with various Zn/(Zn+Sn) ratios ranging from 0.66 to 0.96 were synthesized and their application as buffer layers in CZTSSe solar cells was investigated. The solar cells fabricated with ZnSnO buffer layers exhibit a significant improvement in short-circuit current density (J(sc)) compared to the CdS-buffered reference device, primarily due to the wide band gap and high transparency of ZnSnO films. The CZTSSegnSnO solar cell results also demonstrated that the device parameters, particularly the open-circuit voltage (V-oc) and fill factor (FF), were significantly affected by the Zn/(Zn+Sn) ratio. A cell efficiency of 8.54% with a V-oc of 0.436 V, J(sc) of 32.98 mA cm(-2), and FF of 0.59 was obtained with ALD ZnSnO buffer layer with an optimal Zn/(Zn+Sn) ratio of 0.76. Increasing or decreasing the Zn/(Zn+Sn) ratio leads to a gradual decrease in the FF and V-oc values, which eventually deteriorates device performance. Additionally, the uniform and conformal ALD process results in superior cell-to-cell uniformity for ZnSnO-buffered devices compared to chemicalbath-deposited CdS buffer layers. (C) 2021 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据