期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 61, 期 SI, 页码 -出版社
IOP Publishing Ltd
DOI: 10.35848/1347-4065/ac54f8
关键词
plasma jet CVD; amorphous carbon film; diamond-like carbon; high-rate deposition
资金
- Osawa Scientific Studies Grants Foundation
In this study, DLC films with excellent mechanical properties were fabricated by applying a negative DC pulsed voltage, and the effect of the voltage on the thickness and characteristics of the films was investigated.
Diamond-like carbon (DLC) films with excellent mechanical properties are used as functional surface protective films for cutting tools. The deposition rate of DLC films using conventional plasma chemical vapor deposition (CVD) methods is several hundred nm min(-1). This study applied a negative DC pulsed voltage to a substrate stage irradiated with an Ar/C2H2 mixed plasma jet. The effect of the voltage applied to the stage on the fabricated DLC films was investigated based on the thicknesses and characteristics of the films. DLC films were formed on Si substrates using an Ar/C2H2 plasma jet CVD system. Ar plasma was ejected from a circular nozzle, and C2H2 gas was supplied as a carbon source gas from the center of the circular nozzle. DLC films with a nanoindentation hardness of 17 GPa were obtained by applying -500 V to the stage with a deposition rate of 2140 nm min(-1).
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