LabView based virtual calorimetric etching solution analyzer (CESA) for the online quantification of hydrogen peroxide for the semiconductor industry

A virtual instrument, calorimetric etching solution analyzer based on LabVIEW 2010 platform was developed, characterized and validated for the on-line automated H2O2 concentration monitoring in SC-1 etching solution applied in the semiconductor industry. The virtual instrument completely controls all analyzer functions including sampling, analytical response measurement, digital data processing and H2O2 concentration calculation as well as the instrument calibration and real time concentration correction by fresh solution addition to the etching machine. The hardware, the software, the user interface and the instrument functioning are presented and discussed with the analytical characterization and validation by industrial sample analysis in comparison with a standard permanganate method.

Automated summary

A virtual instrument based on LabVIEW 2010 platform was developed for automated monitoring of H2O2 concentration in SC-1 etching solution in semiconductor industry. The instrument controls all analyzer functions and allows for real-time concentration correction by adding fresh solution to the etching machine. Analytical characterization and validation were conducted using industrial sample analysis compared to a standard permanganate method.