期刊
IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 68, 期 11, 页码 5618-5622出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2021.3115732
关键词
Amorphous silicon indium zinc oxide (a-SIZO); field effect mobility (mu(FE)); multilayered structure; thin-film transistor (TFT)
资金
- Gachon University Research Fund of 2021 [GCU202102850001]
Amorphous oxide-based thin-film transistors (TFTs) have been successfully fabricated and analyzed, showing increased electrical mobility and stability. By inserting a-SIZO conductive semiconductor layer into a bilayer TFT, an improved field effect mobility has been achieved. The study achieved a mobility higher than 160 cm(2)/V center dot s with a Vth shift of 1.19 V for an amorphous-based semiconducting multilayer TFT under negative bias temperature stress (NBTS).
Amorphous oxide-based thin-film transistors (TFTs) have been applied to display and various nextgeneration applications. The amorphous oxide thin film has exhibited a higher electricalmobility and stability characteristics in recent decades. A multilayer thin-film structure has been fabricated and analyzed using amorphous Si-In-Zn-O (a-SIZO) and amorphous Si-Zn-Sn-O (a-SZTO) materials. The a-SIZO had a current value of more than 10(-3) A without OFF-current (like metal) when fabricated as a single layer of thin film. The fabricated bilayer TFT shows an improved field effect mobility upon inserting the a-SIZO conductive semiconductor layer at the bottom. With the aforementioned architecture, we have achieved a mobility that is higher than 160 cm(2)/V center dot s with a Vth shift of 1.19 V under negative bias temperature stress (NBTS) for an amorphous-based semiconducting multilayer TFT.
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