4.7 Article

Anisotropic Etching of CVD Grown Graphene for Ammonia Sensing

期刊

IEEE SENSORS JOURNAL
卷 22, 期 5, 页码 3888-3895

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JSEN.2022.3146220

关键词

Graphene; Sensors; Etching; Fluid flow; Optical microscopy; Microscopy; Sensitivity; Graphene; ammonia; QCM; hydrogen etching; anisotropic etching; gas sensors

资金

  1. TUBITAK ULAKBIM
  2. High Performance and Grid Computing Center (TR-Grid e-Infrastructure)
  3. FLAG-ERA under Project TRANS-2D-TMD
  4. Scientific and Technological Research Council of Turkey (TUBITAK) [112T946]
  5. Flemish Science Foundation (FWO-Vl)

向作者/读者索取更多资源

The sensitivity of graphene-based sensors to ammonia was improved by etching, and the etched sensors showed higher resistance to humidity.
Bare chemical vapor deposition (CVD) grown graphene (GRP) was anisotropically etched with various etching parameters. The morphological and structural characterizations were carried out by optical microscopy and the vibrational properties substrates were obtained by Raman spectroscopy. The ammonia adsorption and desorption behavior of graphene-based sensors were recorded via quartz crystal microbalance (QCM) measurements at room temperature. The etched samples for ambient NH3 exhibited nearly 35% improvement and showed high resistance to humidity molecules when compared to bare graphene. Besides exhibiting promising sensitivity to NH3 molecules, the etched graphene-based sensors were less affected by humidity. The experimental results were collaborated by Density Functional Theory (DFT) calculations and it was shown that while water molecules fragmented into H and O, NH3 interacts weakly with EGPR2 sample which reveals the enhanced sensing ability of EGPR2. Apparently, it would be more suitable to use EGRP2 in sensing applications due to its sensitivity to NH3 molecules, its stability, and its resistance to H2O molecules in humid ambient.

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