期刊
IEEE ELECTRON DEVICE LETTERS
卷 42, 期 12, 页码 1747-1750出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2021.3123652
关键词
Lateral GaN Schottky barrier diode; plasma-free etching technique; low leakage current; low turn-on voltage
资金
- Fundamental Research Funds for the Central Universities [JB211103]
- Key Research and Development Programof Shaanxi Province [2020ZDLGY05-05]
- Wuhu and Xidian University Special Fund for Industry-UniversityResearch Cooperation [XWYCXY-012020007]
The letter presents high-performance AlGaN/GaN SBDs with a balance between forward and reverse characteristics. Lateral GaN SBDs with low turn-on voltage and low reverse current were obtained using optimized wet etching technique and low work-function anode. Additionally, a high breakdown voltage and power figure-of-merit were achieved for the fabricated GaN SBD with specific spatial distance and optimized wet etching technique, showing great potential for next-generation power electronics.
In this letter, high-performance AlGaN/GaN Schottky barrier diodes (SBDs) with a great balance between forward and reverse characteristics are demonstrated. Benefiting from a plasma-free, low-damaged wet etching technique of an AlGaN layer at the anode region and low work-function tungsten (W) as the anode, lateral GaN SBDs with a low turn-on voltage (V-T) of 0.43 V and a low reverse current (I-R) of 90 nA/mm are obtained. Meanwhile, owing to the flattened self-terminated etching surface and the assistance of SiN passivation grown by low-pressure chemical vapor deposition, a high breakdown voltage of 1.83 kV and a power figure-of-merit (FOM) of 1.20 GW/cm(2) are achieved for the fabricated GaN SBD with a spatial distance (L-AC) of 15 mu m from cathode to anode. The lateral GaN SBD fabricated with the optimized wet etching technique shows great potential for next-generation power electronics.
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