4.6 Article

Accurate Lifetime Estimation of Sub-20-nm NAND Flash Memory

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 63, 期 2, 页码 659-667

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2015.2509004

关键词

Activation energy (E-a); Arrhenius model; contribution rate (CR); criterion of Delta V-th_Total; lifetime estimation; multilevel cell NAND flash memory; program/erase cycling times; retention time

资金

  1. Samsung Electronics Corporation
  2. Inter-University Semiconductor Research Center
  3. Brain Korea 21 Plus Project

向作者/读者索取更多资源

Previously, we developed a charge loss/gain model for NAND flash memory, which is taking into account various failure mechanisms. In addition, we extracted all the parameters of the new model in the highest (PV3) and lowest states (ERS). In this paper, however, the physical information for the parameters and the whole procedure of the parameter extraction are covered in detail. We also extracted the contribution rate (CR) of dominant mechanisms at the criterion of vertical bar Delta V-th_Total vertical bar according to the baking temperature. The results give the physical reason for abnormal retention behaviors such as apparent activation energy (E-aa) roll-off at the PV3 state and negative E-aa at the ERS state. Using the proposed method, we extracted the accurate lifetime at room temperature in all states (PV3, PV2, PV1, and ERS). A large gap was observed in the results of the lifetime estimation, which were extracted by the conventional Arrhenius model and the proposed model. Since the proposed model takes into account the retention characteristics for various mechanisms, this model provides a much more accurate prediction for the lifetime.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据