4.6 Article

Antibacterial toxicity of mesoporous silica nanoparticles with functional decoration of specific organic moieties

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ELSEVIER
DOI: 10.1016/j.colsurfa.2021.127612

关键词

Mesoporous silica nanoparticles; Polydopamine; Graphene oxide; Antibacterial toxicity

资金

  1. Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [2021R1A6A1A03038996]
  2. Korea Basic Institute (National Research Facilities and Equipment Center) - Ministry of Education [2019R1A6C1010016]

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This study systematically evaluated the toxicity of mesoporous silica nanoparticles (MSNs) against Escherichia coli (E. coli), finding that residual cetyltrimethyl ammonium bromide (CTAB) affects bacterial mortality and functional decorations such as polydopamine and graphene oxide increase the antibacterial activity of MSNs.
Mesoporous silica nanoparticles (MSNs) are generally considered as biocompatible nanocarriers for biomedical applications; however, no study has provided conclusive evidence regarding the antimicrobial toxicity of MSNs. Here, we systematically evaluated the toxicity of MSNs against Escherichia coli (E. coli) by investigating not only the removal rate of cetyltrimethyl ammonium bromide (CTAB) from the MSNs, but also functional decorations of specific organic moieties such as polydopamine (PDA) and graphene oxide (GO). The mortality of E coli was strongly dependent on the residual CTAB that was not completely removed from the MSNs by acid etching process. On the other hand, for the removal of CTAB from the MSNs the reduced etching time and increased H2O content in the etchant increased the survival of E. coli, probably because of the reduction of bioactive H+ ions that inhibit bacterial growth. Notably, PDA-coated and GO-wrapped MSNs demonstrated the higher toxicity than the pristine MSNs, because of the strong interplay of antibacterial activity of functional decoration (PDA and GO). This study provides a useful guideline for the design of biocompatible MSNs for biomedical applications.

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