4.6 Article

Amine-functionalized fumed silica for CO2 capture through particle molecular layer deposition

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CHEMICAL ENGINEERING SCIENCE
卷 245, 期 -, 页码 -

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ces.2021.116954

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Molecular layer deposition; Carbon/CO2 capture; Solid amine adsorbent; Atomic layer deposition

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This paper introduces a novel method using Particle Molecular Layer Deposition (MLD) to functionalize amines in order to improve regeneration stability and adsorption capacity of supported amine sorbents. The results demonstrate low sorbent regeneration temperatures and stable regeneration of active sites over multiple cycles for both APTES and TMPTA functionalized sorbents. This study marks the first application of an MLD process for sorbent functionalization for CO2 capture, as well as the first use of TMPTA for MLD.
Solid adsorbent materials for CO2 capture have received increasing attention due to the high regenerative energy requirements and physical limitations of traditional liquid systems. Supported amines have become widely-researched materials due to their ambient adsorption capabilities and low regeneration temperatures. Here, Particle Molecular Layer Deposition (MLD) is introduced as a novel loading method for amine functionalization to improve the regeneration stability and adsorption capacity of supported amine sorbents. This paper confirms two MLD chemistries: (3-aminopropyl)triethoxysilane (APTES) and N-1-(3-trimethoxysilylpropyl)diethylene triamine (TMPTA). Both precursors were deposited at 150 degrees C in a binary reaction with water. Adsorption capacity of the amine functional groups increased to similar to 0.005 mmol/m(2) as the number of MLD cycles increased. Low sorbent regeneration temperatures and stable regeneration of active sites over 25 cycles were demonstrated by both the APTES and TMPTA functionalized sorbent. This is the first demonstration of an MLD process used to functionalize a sorbent for CO2 capture. This is also the first use of TMPTA for MLD. (C) 2021 Elsevier Ltd. All rights reserved.

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