期刊
APPLIED SURFACE SCIENCE
卷 566, 期 -, 页码 -出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2021.150631
关键词
N-doped catalyst support; Model alumina; XPS; STM
类别
资金
- Ministry of Science and Higher Education of the Russian Federation [AAAA-A21-121011390011-4]
This article presents a procedure for N-doping of alumina thin film grown on a metal substrate surface, allowing for nitrogen content control by NO pressure. The N-doped alumina support is suitable for catalysis-oriented surface science studies.
This article presents the procedure for N - doping of alumina thin film grown on a metal substrate surface. The modification mechanism for model alumina by nitrogen during film formation is studied by in situ X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). The preparation procedure, based on NO treatment of the growing alumina film, allows for nitrogen content control by NO pressure at a substrate temperature of 670 degrees C. The proposed N - doped model alumina support is suitable for catalysis oriented surface science studies devoted to enhancing supported metal particle resistance to thermal driven sintering.
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