Ion incidence angle dependent pattern formation at AZ 4562® photo resist by Ar+ ion beam erosion

Interactions between ion beams and polymers have great potential to tailor the properties of the polymer surface by modifying the morphology as well as the chemical composition. The application of a wide range of ion incidence angles (0 degrees - 75 degrees) for the erosion of the commercially available photoresist AZ 4562 (R) revealed a multitude of nanopatterns as investigations using atomic force microscopy and scanning electron microscopy have shown. A sequence of angle-dependent patterns (nanoholes, ripples, facets) can be observed, which are already known from inorganic materials. Additionally, the variation of the erosion time (5 min - 60 min) showed an evolution of the nanopatterns. A changed composition of the polymer surface could be detected by means of X-ray photoelectron spectroscopy.

Automated summary

Interactions between ion beams and polymers can tailor the properties of the polymer surface by modifying morphology and chemical composition. Research shows that varying ion incidence angles and erosion time leads to the evolution of different nanopatterns, with changes in polymer surface composition detectable by X-ray photoelectron spectroscopy.