Wafer-Scale and Cost-Effective Manufacturing of Controllable Nanogap Arrays for Highly Sensitive SERS Sensing

The metallic nanogap has been proved as an efficient architecture for surface- enhanced Raman scattering (SERS) applications. Although a lot of nanogap fabrication methods have been proposed in the last few decades, the economical and high-yield manufacturing of sub-10 nm gaps remains a challenge. Here, we present a convenient and cost-effective fabrication method for wafer-scale patterning of metallic nanogaps, which simply combines photolithographic metal patterning, swelling-induced nanocracking, and superimposition metal sputtering without requiring expensive nanofabrication equipment. By controlling the swelling time and metal deposition thickness, the gap size can be precisely defined, down to the sub-10 nm scale. Furthermore, we demonstrate that the fabricated nanogap array can be used as an excellent SERS substrate for molecule measurements and shows a high Raman enhancement factor of similar to 10(8) and a high sensitivity for the detection of rhodamine 6G (R6G) molecules, even down to 10(-14) M, indicating an extraordinary capability for single-molecule detection. Due to its high controllability and wafer-scale fabrication capability, this nanogap fabrication method offers a promising route for highly sensitive and economical SERS detections.

Automated summary

A convenient and cost-effective fabrication method for metallic nanogaps was proposed, which combines photolithographic metal patterning, swelling-induced nanocracking, and superimposition metal sputtering. The fabricated nanogap array showed excellent performance for molecule measurements and demonstrated high sensitivity for single-molecule detection.