相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Investigation of the Heteroepitaxial Process Optimization of Ge Layers on Si (001) by RPCVD
Yong Du et al.
NANOMATERIALS (2021)
The Effect of Doping on the Digital Etching of Silicon-Selective Silicon-Germanium Using Nitric Acids
Yangyang Li et al.
NANOMATERIALS (2021)
Vertical Sandwich GAA FETs With Self-Aligned High-k Metal Gate Made by Quasi Atomic Layer Etching Process
Yongkui Zhang et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2021)
Vertical Sandwich Gate-All-Around Field-Effect Transistors With Self-Aligned High-k Metal Gates and Small Effective-Gate-Length Variation
Xiaogen Yin et al.
IEEE ELECTRON DEVICE LETTERS (2020)
State of the Art and Future Perspectives in Advanced CMOS Technology
Henry H. Radamson et al.
NANOMATERIALS (2020)
Selective Digital Etching of Silicon-Germanium Using Nitric and Hydrofluoric Acids
Chen Li et al.
ACS APPLIED MATERIALS & INTERFACES (2020)
Strained Si0.2Ge0.8/Ge multilayer Stacks Epitaxially Grown on a Low-/High-Temperature Ge Buffer Layer and Selective Wet-Etching of Germanium
Lu Xie et al.
NANOMATERIALS (2020)
Study of Isotropic and Si-Selective Quasi Atomic Layer Etching of Si1-xGex
Xiaogen Yin et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2020)
Strained Germanium Gate-All-Around pMOS Device Demonstration Using Selective Wire Release Etch Prior to Replacement Metal Gate Deposition
L. Witters et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2017)
Predicting synergy in atomic layer etching
Keren J. Kanarik et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2017)
The Challenges of Advanced CMOS Process from 2D to 3D
Henry H. Radamson et al.
APPLIED SCIENCES-BASEL (2017)
Wet Selective SiGe Etch to Enable Ge Nanowire Formation
Farid Sebaai et al.
ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES XIII (2016)
Overview of atomic layer etching in the semiconductor industry
Keren J. Kanarik et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2015)
Quasi-analytical model of ballistic cylindrical surrounding gate nanowire MOSFET
Wanjie Xu et al.
MICROELECTRONIC ENGINEERING (2015)
Highly Selective Dry Etching of Germanium over Germanium-Tin (Ge1-xSnx): A Novel Route for Ge1-xSnx Nanostructure Fabrication
Suyog Gupta et al.
NANO LETTERS (2013)
3D Free-Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching
Andreas C. Fischer et al.
ADVANCED FUNCTIONAL MATERIALS (2012)
Etch characteristics of Si1-xGex films in HNO3:H2O:HF
Xue ZhongYing et al.
SCIENCE CHINA-TECHNOLOGICAL SCIENCES (2011)
Wet Chemical Etching of Si, Si1-xGex, and Ge in HF:H2O2:CH3COOH
B. Hollaender et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2010)
Opportunities and challenges for Ge CMOS - Control of interfacing field on Ge is a key
Akira Toriumi et al.
MICROELECTRONIC ENGINEERING (2009)
Si, SiGe Nanowire Devices by Top-Down Technology and Their Applications
Navab Singh et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES (2008)
Electron mobility enhancement using ultrathin pure Ge on Si substrate
CC Yeo et al.
IEEE ELECTRON DEVICE LETTERS (2005)
Application of high-resolution x-ray diffraction for detecting defects in SiGe(C) materials
HH Radamson et al.
JOURNAL OF PHYSICS-CONDENSED MATTER (2005)
Oxidation rate enhancement of SiGe epitaxial films oxidized in dry ambient
M Spadafora et al.
APPLIED PHYSICS LETTERS (2003)