In situ photografting during direct laser writing in thermoplastic microchannels

A method for in situ photografting during direct laser writing by two-photon polymerization is presented. The technique serves as a powerful approach to the formation of covalent bonds between 3D photoresist structures and thermoplastic surfaces. By leveraging the same laser for both pattern generation and localized surface reactions, crosslinking between the bulk photoresist and thermoplastic surface is achieved during polymerization. When applied to in-channel direct laser writing for microfluidic device fabrication, the process yields exceptionally strong adhesion and robust bond interfaces that can withstand pressure gradients as high as 7 MPa through proper channel design, photoinitiator selection, and processing conditions.

Automated summary

The new method of in situ photografting during direct laser writing using two-photon polymerization offers a powerful approach to forming covalent bonds between 3D photoresist structures and thermoplastic surfaces. When applied to microfluidic device fabrication, it can create exceptionally strong adhesion and robust bond interfaces capable of withstanding pressure gradients as high as 7 MPa through proper channel design, photoinitiator selection, and processing conditions.