Towards Scalable Large-Area Pulsed Laser Deposition

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 mm) since the area of the laser spot (1-5 mm(2)) on the surface of the ablated target is incommensurably smaller than the substrate area. This paper reports the methodology that allows to calculate the distribution profile of the film thickness over the surface substrate with a large diameter, taking into account the construction and technological parameters of the pulsed laser deposition equipment. Experimental verification of the proposed methodology showed that the discrepancy with the experiment does not exceed 8%. The modeling of various technological parameters influence on the thickness uniformity has been carried out. Based on the modeling results, recommendations and parameters are proposed for manufacturing uniform thickness films. The results allow for increasing the film thickness uniformity with the thickness distribution < 5% accounts for similar to 31% of 300 mm diameter substrate.

Automated summary

This paper presents a methodology for calculating the distribution profile of film thickness on large diameter substrates in pulsed laser deposition, allowing for increased film thickness uniformity. Experimental verification showed a discrepancy of less than 8%, with modeling results providing recommendations for manufacturing uniform thickness films.