Investigation into the electrodeposition of Ga-Fe-O thin films

In this work we present an exhaustive investigation about the possibility of using the electrodeposition technique to grow Ga-Fe-O thin films. The morphological and structural characterization has been performed by means of scanning electron microscopy, X-ray diffractometry and X-ray absorption near edge structure measurements. These results have been complemented with chronoamperometric measurements recorded during growth. We have explored different electrolytes, growth potentials, and pH being observed that it is possible to tune the Fe/ Ga ratio by means of the potential whereas the surface morphology is closely related to the Na3-citrate content in the electrolyte. The surface roughness is reduced as the Fe content in the layer is increased upon the raise of citrate in the electrolyte composition. X-ray diffractometry indicates that Ga can become partially oxidized, whereas Fe seems to keep its metallic state in its vast majority since we have not obtained clear evidences of oxidation. Thus, this investigation highlights the inherent difficulties to synthetize Ga-Fe-O compounds by means of the electrodeposition technique.

Automated summary

This study investigates the possibility of growing Ga-Fe-O thin films using the electrodeposition technique. It is found that the Fe/Ga ratio can be controlled by adjusting the potential, and the surface morphology is related to the Na3-citrate content in the electrolyte. X-ray diffractometry suggests partial oxidation of Ga and predominantly metallic state of Fe. The study highlights the inherent difficulties in synthesizing Ga-Fe-O compounds.