Electrochromism in MoO3 nanostructured thin films

Molybdenum trioxide thin films were grown onto well cleaned Indium Tin Oxide coated glass substrate by Pulsed Laser Deposition technique in presence of oxygen partial pressure about 100 mTorr and at several substrate temperature (Ts) ranging from 100 degrees C to 400 degrees C. Systematic characterisation of grown films is employed in order to study the growth of films, structure, optical and electrochromic properties. Presence of only Mo and O elements in Energy Dispersive Spectra of grown films stated that the films were pure without any contaminants. The films were showing mixed alpha and 13 phase at Ts = 100 degrees C and slowly turns to alpha-phase with rise of substrate temperature to 400 degrees C. The grain size was observed to be increased in the films deposited up to 300 degrees C which is supported by Scanning Electron Microscopic and Atomic Force Microscopic images. The variation in the optical transmittance, bandgap and electrochromic efficiency with respect to substrate temperature are clearly discussed in this research paper.

Automated summary

In this study, molybdenum trioxide thin films were grown on Indium Tin Oxide coated glass substrates using Pulsed Laser Deposition technique. Systematic characterization was conducted to investigate the growth, structure, and optical properties of the films. The research revealed that the film properties such as structure, grain size, and optical transmittance varied with substrate temperature.