Hole Transport Layer based on atomic layer deposited V2Ox films: Paving the road to semi-transparent CZTSe solar cells

This work explores the use of very thin transparent vanadium oxide films deposited by atomic layer deposition (ALD) technique as hole transport layer for CZTSe solar cells as alternative of opaque molybdenum based contacts. Contact resistivity between the CZTSe absorber and the ALD V2Ox contact was measured. In order to improve contact quality, a cleaning bath using hydrofluoric acid (HF) dip, was also analyzed and its influence on kesterite surface was studied. Elementary material characterization and composition analysis of the V2Ox layers was performed. Contact quality was assessed yielding contact resistivity values below 9 and 30 m Omega cm2 for ALD and thermal evaporated V2Ox films respectively. The proposed ALD V2Ox based hole transport layer was deposited onto a glass covered with a transparent conductive oxide forming part of the rear contact scheme of a vertical CZTSe solar cell with a conventional ITO/ CdS stack as electron transport layer. The impact of subsequent thermal post-annealing treatments in the cell performance was also analyzed yielding efficiency up to 3.9% on a semi-transparent CZTSe solar cell without any additional optimization process. In this way, a CZTSe solar cell with both transparent electrodes has been demonstrated paving the way to obtain in the future high efficiency bifacial and/or semitransparent Building -integrated photovoltaic devices.

Automated summary

This study investigates the use of transparent vanadium oxide films as hole transport layer for CZTSe solar cells, with contact resistivity measurements and analysis of a cleaning bath to improve contact quality. The material characterization and composition analysis of the V2Ox layers were evaluated to assess contact quality.