期刊
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
卷 219, 期 4, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.202100419
关键词
E-band; InAs; molecular beam epitaxy; quantum dot laser; trilayer quantum dot
资金
- New Energy and Industrial Technology Development Organization (NEDO) [JPNP13004]
- JSPS [15H05700]
- Grants-in-Aid for Scientific Research [15H05700] Funding Source: KAKEN
The trilayer quantum dot structure has successfully extended the emission wavelength to 1370 nm without the need for metamorphic buffer layers, demonstrating great potential for high-performance QD lasers on GaAs substrate.
The introduction of a closely stacked quantum dot (QD) structure is considered as one of the most effective approaches to extend the emission wavelength of InAs/GaAs QDs beyond 1.3 mu m (1300 nm). Herein, a trilayer QD structure (three closely stacked QD layers) is proposed to further extend the emission wavelength of QDs. Room-temperature (RT) emission at 1418 nm from InAs/GaAs trilayer QDs is demonstrated. Moreover, based on these results, an E-band InAs/GaAs trilayer QD laser is fabricated on a GaAs substrate, achieving RT oscillation at 1370 nm with a low threshold current density of 96 A cm(-2) under continuous-wave mode operation. The results indicate that the trilayer QD structure is promising for realizing high-performance QD lasers on GaAs substrate over 1300 nm without incorporating metamorphic buffer layers.
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