Structural characterization and optical properties of nanostructured indium (III) phthalocyanine chloride/FTO thin films for photoelectric applications

In photoelectric applications, indium chloride phthalocyanine (InClPc) films are used. However, these films have not been extensively studied. The deposition of InClPc films on cleaned fluorinedoped tin oxide (FTO) substrates was achieved by the thermal vacuum evaporating technique. The structure and morphology of the InClPc/FTO sample were checked by X-ray diffraction and atomic force microscopy. It was found that the films consist of fine particles with spherical structures dispersed across the surface with the grain size increased from 79 to 126 nm as film thicknesses increase from 48 to 137 nm, respectively. The linear optical constants of InClPc films are extracted from spectroscopy of reflectance and transmittance in the wavelength range of 250-2500 nm. The InClPc films have two energy gaps with values of Eg1 = 1.37 eV and Eg2 = 2.84 eV, which slightly change with the effect of thickness. According to Miller's law, nonlinear optical parameters were evaluated. Two separate laser sources (red He-Ne laser and green diode laser) were used for the optical limiting testing. As well as the red He-Ne laser power intensity performance is high.

Automated summary

The structure and optical properties of InClPc films deposited on FTO substrates by thermal vacuum evaporation technique were studied, revealing two energy gaps and nonlinear optical parameters. The optical limiting testing showed high performance of the red He-Ne laser.