A Comparative study of the effective surface impedance of an HTc superconducting thin film from visible to mid-IR region

In the present work, we demonstrate a comparative theoretical study for the effective surface impedance (ESI) of a HTc superconducting thin film through different electromagnetic spectrum regions such as the visible, near-infrared (NIR), and mid-infrared (MIR). Our numerical calculations are based on the impedance transformations technique (ITs) which in turn relates the ESI with the fundamental properties of HTc superconductors. In this regard, we present this study according to varying the two fundamental parameters; the operating temperature and the thickness of the superconducting thin film from the visible to MIR regions. We found that both values of the effective surface resistance R-s,R-eff and reactance X-s,X-eff are increased with increasing the frequency of the considered spectrum region where in visible regions the values of R-s,R-eff and X-s,X-eff are higher than that of the NIR and MIR regions. It is worth to mention that, the importance of this study is represented in two substantial aspects. The surface resistance demonstrates how the electromagnetic power dissipation within the superconducting thin film which in turn specifies the performance of the superconductor based devices. The surface reactance (the imaginary of the surface impedance) is proportional to the magnetic-field penetration depth which is considered an important basic property for superconductivity.

Automated summary

This study presents a comparative theoretical analysis of the effective surface impedance of a HTc superconducting thin film across different electromagnetic spectrum regions. The research shows variations in the values of effective surface resistance and reactance with increasing frequency, with higher values in the visible region compared to NIR and MIR regions. The significance of the study lies in understanding the electromagnetic power dissipation and magnetic-field penetration depth in superconducting thin films for device performance.