期刊
MATERIALS CHEMISTRY AND PHYSICS
卷 276, 期 -, 页码 -出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.matchemphys.2021.125234
关键词
Metallic bipolar plates; Interfacial contact resistance; Corrosion resistance; Amorphous carbon films
The introduction of Ti atoms in α-C film can significantly improve its electrical properties, corrosion resistance, stability under nobler potentials, and durability in service environments.
The corrosion of metal bipolar plates(BPs) in the environment of PEMFCs (proton exchange membrane fuel cells) not only increases the interfacial contact resistance (ICR) of BPs, but also poisons the proton exchange membrane and catalytic layer. In this work, different Ti-doped amorphous carbon (alpha-C) film were deposited on SS316L substrate though DC-balanced magnetron sputtering technology. The effect of Ti doping amount on the hybridization type and microstructure evolution mechanism of alpha-C film are explored, and its influence on corrosion resistance and electrical properties of the film was further evaluated. The results show that introduce Ti atoms to the alpha-C film can promote the sp(2) hybridization and generate the low resistivity carbide phase, which decrease the ICR of the film from 5.64 m Omega/cm(2) to 3.43 m Omega/cm(2). More importantly, the introduction of Ti atoms can also improve the stability of the alpha-C film under nobler potential (1.4 V (SCE)) environment, promote the durability of the film in the service environment. The Ti-doped alpha-C film can be used as a modified coating of SS316L and act as candidate supplies for PEMFCs.
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