期刊
JOURNAL OF APPLIED PHYSICS
卷 130, 期 2, 页码 -出版社
AIP Publishing
DOI: 10.1063/5.0054321
关键词
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资金
- Intel Corp.
- AFOSR [FA9550-20-1-0148]
- National Science Foundation (NSF) [1710298, 1534303]
- NSF [NNCI-2025233]
- NSF MRSEC program [DMR-1719875]
- NSF MRI programs [DMR-1429155, DMR-1338010]
- PARADIM, NSF Materials Innovation Platform program [DMR-1539918]
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [1710298] Funding Source: National Science Foundation
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [1534303] Funding Source: National Science Foundation
High-conductivity undoped GaN/AlN 2D hole gases, after introducing impurity blocking layers, eliminate variations in density and transport properties, resulting in a 2-3x increase in hole conductivity compared to structures without impurity blocking layers.
High-conductivity undoped GaN/AlN 2D hole gases (2DHGs), the p-type dual of the AlGaN/GaN 2D electron gases (2DEGs), have offered valuable insights into hole transport in GaN and enabled the first GaN GHz RF p-channel FETs. They are an important step toward high-speed and high-power complementary electronics with wide-bandgap semiconductors. These technologically and scientifically relevant 2D hole gases are perceived to be not as robust as the 2DEGs because structurally similar heterostructures exhibit wide variations of the hole density over Delta p(s) > 7 x 10(13) cm(-2), and low mobilities. In this work, we uncover that the variations are tied to undesired dopant impurities such as silicon and oxygen floating up from the nucleation interface. By introducing impurity blocking layers (IBLs) in the AlN buffer layer, we eliminate the variability in 2D hole gas densities and transport properties, resulting in a much tighter control over the 2DHG density variations to Delta p(s) <= 1 x 10(13) cm(-2) across growths, and a 3x boost in the Hall mobilities. These changes result in a 2-3x increase in hole conductivity when compared to GaN/AlN structures without IBLs.
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