Understanding thickness dependent magnetic properties of Tb-Fe thin films

In this paper, we have attempted to understand the magnetic behaviour of Tb-Fe thin films grown with different thicknesses through detailed electron microscopy, magnetization measurements and magnetic domain imaging studies. Tb-Fe thin films over a range of thicknesses such as 50, 100, 200, 400, 600 and 800 nm were deposited on Si < 100 > substrates using electron beam evaporation technique. Grazing incidence X-ray diffraction studies revealed that all the films were amorphous in nature. Microstructural studies using transmission electron microscopy showed columnar channel of voids extending from substrate to film surface. Magnetization measurements along the in-plane and out-of-plane direction indicated presence of out-of-plane magnetic anisotropy in all the films. Saturation magnetization and coercivity measured along the out-of-plane direction were found to vary with the thickness of the films. A very high coercivity of similar to 2000 mT was obtained for the film having thickness of 400 nm. Magnetic anisotropy calculations indicated a strong perpendicular magnetic anisotropy for the 400 nm thick film. The variation of magnetic anisotropy with film thickness was correlated with the magnetic domain patterns observed in the films using magnetic force microscopy. (C) 2021 Elsevier B.V. All rights reserved.

Automated summary

This study investigated the magnetic behavior of Tb-Fe thin films with different thicknesses, revealing the presence of out-of-plane magnetic anisotropy in these films.