期刊
CARBON
卷 177, 期 -, 页码 35-43出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2021.02.058
关键词
Graphite; Supersaturation; Ultrafine grains; Ni substrate; Carbon diffusion
资金
- Samsung Electronics' University RD program [IO 190410e06222, IO 191226e06966]
By fabricating a carbon-supersaturated Ni foil and depositing an additional Ni film on top of it, the uneven morphologies and qualities of multilayer-graphene or nanometer-thick graphite films on Ni grains with different orientations can be improved. Rapid formation of NGF on the Ni film after re-annealing the Ni film/ss-Ni foil system results in enhanced thickness and quality uniformity.
When a polycrystalline Ni foil is used as the substrate for the chemical vapor deposition synthesis of multilayer-graphene or nanometer-thick graphite films (NGFs), these films always exhibit uneven morphologies and qualities on Ni grains with different orientations. In this study, we fabricated a carbon-supersaturated Ni foil (ss-Ni foil) to function as a carbon source through an ultrafast cooling process (similar to 180 degrees C/s), while an additional Ni film was sputtered on the ss-Ni foil to act as a buffer layer and a new surface for NGF growth. By re-annealing the Ni film/ss-Ni foil system at a low temperature (similar to 650 -800 degrees C) within a short duration, NGF can rapidly form on the Ni film owing to the high supersaturation degree of the ss-Ni foil. The grain growth of the Ni film is limited by the low-temperature growth process, and the ultrafine grains of Ni film averaged the grain orientation effect from the Ni foil. The NGF formed on the Ni film/ss-Ni foil showed a significant improvement in thickness and quality uniformity, and we studied the influences of Ni film thickness as well as re-annealing temperature and time on the diffusion of carbon in the Ni film/ss-Ni foil system and summarized the growth mechanism. (c) 2021 Elsevier Ltd. All rights reserved.
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