4.6 Article

Effects of Sn substitution in SrRuO3 epitaxial films

期刊

APPLIED PHYSICS LETTERS
卷 119, 期 11, 页码 -

出版社

AIP Publishing
DOI: 10.1063/5.0061902

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  1. U.S. Department of Energy, Basic Energy Sciences, Materials Sciences and Engineering Division and Scientific User Facilities Division
  2. Korea Basic Science Institute (National research Facilities and Equipment Center) - Ministry of Education [2021R1A6C101A429]
  3. National Research Foundation of Korea (NRF) - Korea government (MSIT) [2021R1F1A1056934]
  4. National Research Foundation of Korea [2021R1A6C101A429, 2021R1F1A1056934] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Epitaxial SrRu1-xSnxO3 thin films were deposited on SrTiO3 substrates using pulsed laser deposition, showing good crystalline quality and smooth surface. Sn doping can tune chemical pressure and magnetism, leading to an increase in resistivity and decrease in ferromagnetism of the films.
Epitaxial SrRu1-xSnxO3 (0 <= x <= 1) thin films were deposited on SrTiO3 (001) substrates by sequential two-target synthesis using pulsed laser deposition to achieve stable phases in this family of quaternary perovskites. The SrRu1-xSnxO3 films exhibit a good crystalline quality, a sharp interface between film and substrate, and an atomically smooth surface. A gradual expansion of the c-axis lattice parameter was observed with Sn doping serving as a means to tune chemical pressure and magnetism. With an increase in Sn doping, the resistivity of the film increased, and the ferromagnetism decreased. These results illustrate use of lattice engineering, e.g., tuning of c-axis lattice parameter with chemical doping, to control electronic and magnetic properties of epitaxial thin films for applications in oxide electronics.(c) 2021 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http:// creativecommons.org/licenses/by/4.0/). https://doi.org/10.1063/5.0061902

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