Substantial P-Type Conductivity of AlN Achieved via Beryllium Doping

Beryllium has long been predicted by first principle theory as the best p-type dopant for GaN and AlN. But experimental validation of these theories has not, until now, borne out the original predictions. A key challenge is the dopant-induced strain leading to Be rejection from substitutional sites in favor of interstitial sites, leading to self-compensation. More flexible growth methods like metal modulated epitaxy (MME) that can operate at substantially lower temperatures than traditional approaches, can more effectively place Be into the proper substitutional lattice sites. MME grown Be-doped AlN shows substantial p-type conductivity with hole concentrations in the range of 2.3 x 10(15)-3.1 x 10(18) cm(-3) at room temperature. While others have achieved sizable carrier concentrations near surfaces via carbon doping or Si implantation, this is the only known demonstration of substantial bulk p-type doping in AlN and is a nearly 1000 times higher carrier concentration than the best previously demonstrated bulk electron concentrations in AlN. The acceptor activation energy is found to be approximate to 37 meV, approximate to 8 times lower than predicted in literature but on par with similar results for MME p-type GaN. Preliminary results suggest that the films are highly compensated. A p-AlN:Be/i-GaN:Be/n-GaN:Ge pin diode is demonstrated with substantial rectification.

Automated summary

While beryllium has long been predicted as the best p-type dopant for GaN and AlN, experimental validation has not always been consistent with these predictions. Metal modulated epitaxy (MME) grown Be-doped AlN shows significant p-type conductivity with the potential for practical applications.