期刊
JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T
卷 12, 期 -, 页码 170-185出版社
ELSEVIER
DOI: 10.1016/j.jmrt.2021.02.066
关键词
Cobalt; Nickel; Electrodeposition; Ionic liquid; Electrochemical analysis; SEM
A novel ionic liquid [FPIM]Br was used as an additive for cobalt and nickel electrodeposition, leading to finer-grained deposits with increased current efficiency, hardness, and corrosion resistance. The additive served as an effective brightener, producing highly uniform and smooth Co and Ni deposits. Adsorption of [FPIM](+) was observed on the copper substrate, following the Langmuir adsorption isotherm.
A novel ionic liquid, namely, 1-(4-fluorobenzyl)-3-(4-phenoxybutyl)imidazole-3-ium bromide [FPIM]Br, was used as an additive for cobalt (Co) and nickel (Ni) electrodeposition from acidic sulfate and Watts baths, respectively. The effect of [FPIM]Br on the electrodeposition mechanism of the coatings was investigated by a variety of electrochemical methods (potentiodynamic cathodic polarization, cyclic voltammetry, and anodic linear stripping voltammetry) as well as by morphologic techniques (XRD, SEM, EDX and AFM). The inhibition of Co2+ and Ni2+ ions deposition in the presence of [FPIM]Br was found to lead to finer-grained deposits. Adsorption of [FPIM](+) on the copper substrate is shown, and the process obeys the Langmuir adsorption isotherm. The cathodic current efficiency (CCE %), hardness and corrosion resistance for Co2+ and Ni2+ deposition in the electrodeposition bath were found to increase when additive was included. The resultant surface morphologies demonstrated that the [FPIM]Br additive served as an effective brightener that can produce highly uniform and smooth Co and Ni deposits. (C) 2021 The Author(s). Published by Elsevier B.V.
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