期刊
AIP ADVANCES
卷 11, 期 4, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/5.0045009
关键词
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资金
- Office of Basic Energy Sciences, U.S. Department of Energy [DE-SC0002765]
- National Science Foundation [DMR-2004870, ECCS-1708907]
- Department of Defense Award [72495RTREP]
- CREST, JST [JPMJCR15F3]
- ARO [W911NF-16-1-0132]
- National Science Foundation, National Nanotechnology Coordinated Infrastructure (NNCI) [ECCS-1542015]
- U.S. Department of Energy (DOE) [DE-SC0002765] Funding Source: U.S. Department of Energy (DOE)
The study found that using sputtered MoRe as a contact method for encapsulated MoS2 poses challenges, as the contact transparency is poor and the devices do not support a measurable supercurrent down to 3 K. This has implications for future fabrication recipes.
Establishing ohmic contact to van der Waals semiconductors such as MoS2 is crucial to unlocking their full potential in next-generation electronic devices. Encapsulation of few layer MoS2 with hBN preserves the material's electronic properties but makes electrical contacts more challenging. Progress toward high quality edge contact to encapsulated MoS2 has been recently reported. Here, we evaluate a contact methodology using sputtered MoRe, a type II superconductor with a relatively high critical field and temperature commonly used to induce superconductivity in graphene. We find that the contact transparency is poor and that the devices do not support a measurable supercurrent down to 3 K, which has ramifications for future fabrication recipes.
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