4.6 Article

The features of transient plasma formation by the surface of metal hydride under the influence of intense electron flux

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VACUUM
卷 187, 期 -, 页码 -

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2021.110142

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Metal hydride; Plasma shielding layer; Electron flux

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This work focuses on the features of a transient plasma formation near a Zr50V50 metal hydride, which is used for protecting the sample from melting by releasing stored hydrogen. The study shows that the current to the metal hydride element can be several times higher than the initial current of the primary plasma source.
In this work, we study the features of a transient plasma formation close to a Zr50V50 metal hydride. The surface is immersed in a direct current primary plasma, which serves as the initial source of electrons. When the surface consists a hydride alloy, it releases the hydrogen stored therein followed by ionization with the electron flux. Due to the potential redistribution in a metal hydride layer and in a layer close to the wall of a vacuum chamber the current to the metal hydride element can be several times higher than the initial current of the primary plasma source. The transient plasma is created on released hydrogen and protects the sample from melting due to energy spending on the ionization and excitation of neutral hydrogen and decomposition of the hydride phases of the material. If there is no stored hydrogen, the plasma forms on the vapor of the sample material causing damage.

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